Zuordnung dimensionelle Messgeräte zu Prüf- und Kalibriernormalen

 

This tabulated synopsis contains currently available artefacts which may be used as standards and which are suitable for the calibration of stylus or optical instruments and SPMs. Standards are listed in an arbitrary order within the sections without any ranking or preference. This list does not imply recommendation or endorsement by Physikalisch-Technische Bundesanstalt, nor does it imply that the listed standards are necessarily the best and/or only available for the purpose. No claim is put forward to the completeness and correctness of the list of manufacturers and products. If you know of further standards that might be included or if you have discovered outdated resp. incorrect data, PTB welcomes your feedback and appreciates any help to improve this list. This list may give a first overview, but it cannot replace consultation with the manufacturer resp. distributor. Please note that PTB itself does not sell standards and does neither benefit from the sale of standards nor from including them in this list. For certified calibration, please contact PTB or any other National Metrology Institute (NMI).

 

Last update:  2007-02-08

 

 

Nr.

Manufacturer

Hersteller

Modell

Model

I

m

a

g

e

Measurement range

Messbereich

Lateral
Measurement Range

 

lateraler

Messbereich

Scanning Dimension

 

äußere Abmessungen

(mm)

Scanning Force

 

Rasterkraft

Scanning electrone

microscop

 

Rasterelektronen Mikroskop

Optical Microscop

 

Opt. Bild

Optical Profiler

 

Opt. Punkt

Taktil Punkt 3D

Taktil Scan 3D

SFM

AFM

SEM

REM

Interference micr.

Confocal

whit light

 

Interfe­renz­mikr., Konfok., Weißli

Fokusssensor,

 

Chrom. Längs

Fibre sensor,

µ- sensor

 

Faser­taster, Boss-Mikro­taster

Profilemeter

 

Profilometer

 

 

 

 

 

µm

mm

 

 

 

 

 

 

 

A)

z - Axis:

Single Step

A)
z - Achse:

Einzelstufen

 

 

 

 

 

 

 

 

 

 

A01

SiMetricS

Depth Setting Standards VS

I

50 nm, ..., 1000 µm

50

50 x 50

x

 

x

x

x

x

A02

Pelco

 

AFM Gold Calibration Kit

I

5, 15, 30 nm

 

Æ 9,9

x

 

 

 

 

 

A03

SLOAN/DEKTAK

now Veeco

 

I

20, 50, 100, 200, 500, 1000, 5000, 10000

 

25 x 25 x 9

x

 

 

 

 

 

A04

VLSI

SHS – 80, -180,
-440, -880, -1800,
-4500, -9400, - QC

I

8, 18, 44, 88, 180, 450, 940 nm

 

25 x 25 x 3

x

x

 

 

 

 

A05

VLSI

SHS – 1.8, -8.0,
-24.0, -50.0, - Q

I

1800, 8000, 24000, 50000 nm

 

25 x 25 x 3

x

x

 

 

 

 

A06

Halle

 

I

200nm, ..., 9µm

 

40 x 20 x 10

 

 

 

x

 

x

A07

MTT

 

I

30, ..., 3000

 

Æ 37,  3 mm thick

 

 

 

 

 

 

A08

PTB 5.1

Cu Depth Setting Standards

I

1, 5, 20, 50, 200, 450, 600, 900, 1000, 2000, 5000 µm

1, ..., 8 mm

45 x 23, thickness: 10/12

 

 

 

x

x

x

 

Home

 

 

B)

z-Axis:

Periodic Steps

B)

z-Achse:

periodische Stufen

 

 

 

 

 

 

 

 

 

 

B01

MikroMasch

TGZ, -01,-02,-03,-04, -11; 

TGF11

 

I

20nm, 100, 500, 1000, 1500nm

3mm x 3mm

5 x 5 x 0,45

x

 

x

x

 

 

B02

MikroMasch

TGF11

I

1750nm

3mm x 3mm

5 x 5 x 0,45

x

 

x

x

 

 

B03

NTT-AT

Si(111) Atomic Steps

I

0,13, 0,31 nm

6mm x 6mm

10 x 10 

x

 

x

x

 

 

 

Home

 

 

C)

z-Axis:

Step Grating

C)

z-Achse:

Stufen

 

 

 

 

 

 

 

 

 

 

C01

MikroMasch

UMG01, 02

I

20, 31 nm

400 x 400

5 x 5

x

 

x

x

 

 

C02

VLSI

STS 2 –180P, -440P,
-1000S, -1800S

I

18, 44, 100, 180 nm

270 x 270

12 x 8 x 0,675

x

x

x

x

 

 

C03

VLSI

STS 3 –180, -440,
-1000, -1800, P

I

18, 44, 100, 180 nm

270 x 270

12 x 8 x 0,5

x

x

x

x

 

 

C04

VLSI

STR 3 –180, -440,
-1000, -1800, -P

I

18, 44, 100, 180 nm

1 200 x
1 200

8 x 8

x

x

x

x

 

 

C05

VLSI

STR 10 -180, -440,
-1000, -1800

I

18, 44, 100, 180 nm

4 000 x
4 000

8 x 8

x

x

x

x

 

 

C06

EU-Standard

partly available from Nanosensors

I

8, 24, 80, 240, 800,

2 400 nm

200 x 200

(1000 x 1000)

5 x 7

x

x

x

x

 

 

 

Home

 

 

D)

x-, y-Axis:

1-Dimensional

D)

x-, y-Achse:

1-Dimensional

 

Nominal pitch

Measur. Area

 

 

 

 

 

 

 

D01

SiMetricS

Lateral Standard LS

I

10...2500 µm

250 ...62500

75 x 20

 

x

 

x

(x)

x

D02

ASM

750-HD

I

750 nm

0,3 mm dick

Æ 6,35

x

x

x

 

 

 

D03

MikroMasch

TGG 01

I

3 000 nm

3 000 x
3 000

5 x 5 x 0,45

x

x

x

 

 

 

D04

Moxtek

MXS – 301, -701,-CE

I

300, 700 nm

 

3 x 4 x0,5

x

x

x

 

 

 

 

Home

 

 

E)

x-, y-Axis:

2-Dimensional

E)

x-, y-Achse:

2-Dimensional

 

 

 

 

 

 

 

 

 

 

E01

ML&C GmbH

Photomask

I

120 mm

120 mm x 120 mm

175 mm x 175 mm

 

x

 

x

 

x

E02

VLSI

STS 2 –180, -440,
-1000, -1800

I

1 800 + 3 000 + 5 000 nm

270 x 270

12 x 8 x 0,675

x

x

x

x

 

 

E03

VLSI

STR 3 –180, -440,
-1000, -1800

I

3 000 nm

1 200 x
1 200

8 x 8

x

x

x

x

 

 

E04

VLSI

STR 3 –180, -440,
-1000, -1800

I

10 000 nm

4 000 x
4 000

8 x 8

x

x

x

x

 

 

E05

EU-Standard

partly available from Nanosensors

I

100, 300 nm

200 x 200

5 x 7

x

x

x

x

 

 

E06

EU-Standard

Partly available from Nanosensors / Ibsen

I

1 000, 3 000, 10 000 nm

2 000 x
2 000

5 x 7

x

x

x

x

 

 

E07

Nanosearch Membrane

NanoCal

I

10 ... 15 nm

 

 

x

x

 

 

 

 

E08

MikroMasch

TGX01

I

3 000 nm

2 000 x
2 000

5 x 5 x 0,45

x

x

x

x

 

 

E09

Moxtek

MXS – 302 CE

I

300 nm

 

3 x 4 x 0,5

x

x

x

x

 

 

E10

Moxtek

MXS – 702 CE

I

700 nm

 

3 x 4 x 0,5

x

x

x

x

 

 

E11

NanoSensors

 

I

200 nm

500 x 500

7 x 7

x

x

 

 

 

 

E12

Pelco

607 – AFM

607 – STM

I

463 nm

(2160 lines/mm)

 

 

x

x

 

 

 

 

E13

SIS

 

I

1 500 nm

100 x 100

 

x

x

x

 

 

 

E14

Supracon

Nanoscale

Linewidth/Pitch - Standard

I

Pitch: 160, 200, 230, 260, 300, 500, 700, 1000, 4000 nm CD: 80 nm to 2µm

10 x 10

8 x 8

x

x

x

 

 

 

 

Home

 

 

F)

3D-Standards

F)

3D-Normal

 

 

 

 

 

 

 

 

 

 

F01

3D-Nano-Normal,  BAM, Pyramide

 

I

 

 

 

x

 

x

x

 

 

 

Home

 

 

G)

Flatness

G)

Ebenheit

 

 

 

 

 

 

 

 

 

 

G01

SiMetricS

Flatness Standard Type FtS

I

PV < 110/65 nm

10mm x 10mm/

5mm x 5mm

15 x 15 x 6

x

 

x

x

x

x

G02

EU-Standard

partly available from Nanosensors

I

PV < 10 nm

250 x 250

5 x 7 x 2

x

 

x

x

x

x

 

Home

 

 

H)

Thickness

H)

Schichtdicke

 

 

 

 

 

 

 

 

 

 

H01

Inst. Mikro elektroden

SiO2 on Si

I

7, 20, 70, 300, 800

4000

5 x 7

x

 

 

 

 

 

 

Home

 

 

I)

Roughness

I)

Rauheit

 

 

 

 

 

 

 

 

 

 

I01

VLSI

RAS-90, 220, 440, 900, 2250, 4700

I

9, 22, 44, 90, 225, 470

~5000 x 4500

25 x 25 x 6

x

 

x

x

 

x

 

Home

 

 

J)

Critical Dimension

J)

Kritische Dimension

 

 

 

 

 

 

 

 

 

 

J01

Pelco

 

I

1, 2, 5, 10µm

length 180 µm

4.8 x 4.5

x

x

x

x

 

 

J02

Supracon

Nanoscale CD - Standard

I

CD: 50, 100, 150, 200, 300 und 800 nm

10 x 10

8 x 8

x

x

(x)

 

 

 

 

Home

 

 

K)

Tip Radius,
Angle, Parallelity

K)

Spitzenradius,
Winkel, Parallelität

 

 

 

 

 

 

 

 

 

 

K01

SiMetricS

Type 1

I

4 gratings with the periods:
0.8; 1.0; 2.0; 2.5 µm
Triangular profile: GrT70
(angle 70.52°)
Triangular profile: GrT109
(angle 109.48°)

 

10 x 10

x

 

x

x

 

x

K02

SiMetricS

Type2

I

1 grating with the period:
8 or 25 µm
Trapezoidal profile: GrTz55
(Trapezoidal angle 54.74°)
Depth: 3 µm for 8 µm period
Depth: 11 µm for 25 µm period
Triangular profile: GrT70
(angle 70.52°)
Triangular profile: GrT109
(angle 109.48°)
Arched profile: GrA

 

10 x 10

x

 

x

x

 

x

K03

SiMetricS

Type3

I

1 grating with the period:
8 or 25 µm
Rectangular profile: GrRw
Depth: 1 µm for 8 µm period
Depth: 5 µm for 25 µm period

 

10 x 10

x

 

x

x

 

x

K04

SiMetricS

Resolution standard Type 4 GrRd

Rectangular profile

I

8 gratings with the periods:
4; 8; 20; 40; 80; 200; 400; 800 µm
Rectangular profile: GrRd
Depth: 90 nm or 3,4 µm

 

 

(x)

 

x

x

x

x

 

Home

 

 

L)

Contour, Profile

L)

Kontur, Profil

 

 

 

 

 

 

 

 

 

 

L01

PTB 5.3

Micro contour artefact

I

100 µm, 250 µm, 500 µm, 1000 µm,

2000 µm

0.5 x 0.5

to

18 x 3

50 x 3 x 15

 

 

 

x

x

x

x

 

Home

 

 

M)

Diameter,

Poundness

M)

Durchmesser,

Zylindrizität

 

 

 

 

 

 

 

 

 

 

M01

PTB 5.3

Micro hole artefact  

I

Ø 100 µm

x 2.4 mm

 

10 x 10

 

 

 

 

x

 

 

Home

 

 

N)

Probing Force

N)

Antastkraft

 

 

 

 

 

 

 

 

 

 

N01

SiMetricS

Probing force standard Type FC 

I

0.005 – 1.0 mN/µm

 

15 x 15

 

 

 

 

x

x

N02

SiMetricS

Probing force standard Type FB 

I

0.3 – 5.5 mN/µm

 

15 x 15

 

 

 

 

x

x

Textfeld: This tabulated synopsis contains currently available artefacts which may be used as standards and which are suitable for the calibration of stylus or optical instruments and SPMs. Standards are listed in an arbitrary order within the sections without any ranking or preference. This list does not imply recommendation or endorsement by PTB, nor does it imply that the listed standards are necessarily the best and/or only available for the purpose. No claim is put forward to the completeness and correctness of the list of manufacturers and products.

            (x) – eingeschränkt

 

 

 

 

 

 

Manufacturer / Distributor and contact address

A01.    SiMetricS GmbH, Siliziumkomponenten für die Messtechnik, Am Südhang 5, 09212 Limbach-Oberfrohna and J. Fruehauf, S. Kroenert, U.    Brand, R. Krueger-Sehm: Attainable precision of silicon dimensional standards. Proc. Euspen Conf. (2004),

joachim.fruehauf@e-technik.tu-chemnitz.de and < www.SiMetricS.de >

 

A02.    PELCO  INTERNATIONAL, P.O. Box 492477, Redding, CA 96049-2477, USA;< www.pelcoint.com/index >

A03.    Veeco GmbH, D-85716 Unterschleißheim, Germany; < www.veeco-europe.com > or  < www.veeco.com >

A04.    VLSI Standards Inc.; 3087 North First Street; San Jose, CA 95134-2006, USA; < www.vlsistd.com >

A05.    See A04.

A06.    Halle Präzisions-Kalibriernormale GmbH, Im Bühfeld 12, D-31234 Edemissen, Germany; Fax: +49 5373 7669

A07.    Meracia Technika- Technocentrum, P.O. Box 249, SK 84000 Bratislava, Slovakia; Fax: +42 17 6542 6143

A08.    PTB Cu Depth Setting Standards, PTB, AG 5.11, Bundesallee 100, 38116 Braunschweig;                                                                    

< www.ptb.de/de/org/5/51/511/index.htm > and U. Brand, G. Hinzmann, H. Schnädelbach, C. Feist, P. Stuht, R. Krüger-Sehm, V. Jäger: Rückführbare Präzisions-Tiefen-Einstellnormale für Messbereiche von 1 µm bis 1 mm (Traceable precision depth setting standards for measurement ranges from 1 µm to 1 mm). Technisches Messen 66, 12 (1999), 496-503. uwe.brand@ptb.de

 

B01.    MikroMasch, Narva mnt. 13, 10151 Tallina, Estonia; < www.mikromasch.com >

B02.    See B01.

B03.    NTT Advanced Techn. Corp., 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan; < www.keytech.ntt-at.co.jp >

 

C01.   See B01.

C02.   See A04.

C03.   See A04.

C04.   See A04.

C05.   See A04.

C06.   EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >

 

D01.   SiMetricS GmbH, Siliziumkomponenten für die Messtechnik, Am Südhang 5, 09212 Limbach-Oberfrohna

joachim.fruehauf@e-technik.tu-chemnitz.de and  < www.SiMetricS.de >

D02.   Advanced Surface Microscopy, Inc. 6009 Knyghton Rd; Indianapolis, IN 46220, USA; < www.asmicro.com >

D03.   See B01.

D04.   Moxtek Inc. Orem, UT 84057, USA; < www.moxtek.com >

 

E01.    ML&C GmbH, Im Steinfeld 5, D-07751 Jena  info@mlc-jena.de < www.mlc-jena.de >

E02.    See A04.

E03.    See A04.

E04.    See A04.

E05.    EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com > 7669 und Ibsen Photonics A/S, DK-3520 Farum, Denmark;  < www.ibsenphotonics.com >

 

 

E06.    EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >  und Ibsen Photonics A/S, DK-3520 Farum, Denmark;  < www.ibsenphotonics.com >

E07.    Nanosearch Membrane GmbH, TSP Nanoengineering, A-1160 Vienna, Austria; < www.nanosearch.at >

E08.    See B01.

 

E09.    See D04.

E10.    See D04.

E11.    NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >

E12.    See A02.

E13.    SIS Surface Imaging Systems GmbH; Kaiserstr. 100, D-52134 Herzogenrath, Germany; < www.sis-gmbh.com >

E14.    Supracon AG, Wildenbruchstr. 15,  07745 Jena, Germany, Tel. +49 (3641) 67 53 80,  Fax. +49 (3641) 67 53 87,

info@supracon.com,  < www.supracon.com >

 

 

F01.    M. Ritter, Bundesanstalt für Materialforschung und-prüfung (BAM), Unter den Eichen 87, 12205 Berlin, info@bam.de < www.bam.de >

 

G01.   See D01.

G02.   EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >

 

H01.    Institute for Microelectronics Stuttgart, Allmandring 30 a, D-70569 Stuttgart, Germany;< www.ims-chips.de >

 

I01.      See A04.

 

J01.    See A02.

J02.    See E14.

 

K01.    See D01.

K02.    See D01.

K03.    See D01.

K04.    See D01.

 

L01.    Neugebauer M, Jusko O, Neuschaefer-Rube U, Wäldele F: Darf´s etwas kleiner sein? Quality Engineering, 9 (2004), 32. And: Neugebauer M, Neuschaefer-Rube U: A new micro artefact for testing of optical and tactile sensors. Proceedings of  Euspen conference 2005.  michael.neugebauer@ptb.de

 

M01.   Brand, U; Neugebauer, M; Neuschaefer-Rube, U; Wilkening, G: Micro-Standards – State of the Art, Prospects and Limits. Proc. Sensor Conf., Vol. 2 (2005), 169-174. ulrich.neuschaefer-rube@ptb.de

 

N01.    See D01.

N02.    See D01.

 

 

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