Standards and reference samples for nano- & micro-measurement systems

This tabulated synopsis contains currently available artefacts which may be used as standards and which are suitable for the calibration of stylus or optical instruments and SPMs. Standards are listed in an arbitrary order within the sections without any ranking or preference. This list does not imply recommendation or endorsement by Physikalisch-Technische Bundesanstalt, nor does it imply that the listed standards are necessarily the best and/or only available for the purpose. No claim is put forward to the completeness and correctness of the list of manufacturers and products. If you know of further standards that might be included or if you have discovered outdated resp. incorrect data, PTB welcomes your feedback and appreciates any help to improve this list. This list may give a first overview, but it cannot replace consultation with the manufacturer resp. distributor. Please note that PTB itself does not sell standards and does neither benefit from the sale of standards nor from including them in this list. For certified calibration, please contact PTB or any other National Metrology Institute (NMI).

                                                                                                                                            

Last update:  2007-02-08

 

 

all PDF Images

 

 

 

 

 

Nr.

No.

Manufacturer

Hersteller

Modell

Model

Measurement range

Messbereich

Description

Beschreibung

I

M

A

G

E

Lateral
Measurement Range

lateraler

Messbereich

Substrat

Substrate

Coating

Beschichtung

Remarks

Bemerkungen

 

 

 

(nm)

 

 

(mm)

Material

Material

Dimension

Dimension. (mm)

Material

Material

Thickness

Dicke

(nm)

 

 

A)
z - Axis:

Single Step

A)
z - Achse:

Einzelstufen

 

 

 

 

 

 

 

 

 

A01.

SiMetricS

Depth Setting Standards VS

50 nm, ..., 1000 µm

grooves with rectan­gular profile and grooves with

54° slope, 100 µm wide,  6 mm length

I

³ 50 x 50

Silicon

50 x 50

 

 

suitable for microscopes

A02.

Pelco

AFM Gold Calibration Kit

5, 15, 30

Colloidal Gold spheres dispersed on Mica

I

 

Mica

Æ 9,9

Colloidal Gold

5 ... 30

suitable also for tip test; mounted on; Æ15 mm AFM disc

A03.

SLOAN/DEKTAK

now Veeco

 

20, 50, 100, 200, 500, 1000, 5000, 10000

single bar with rectangular profile,

100 µm wide,

750 µm length

I

 

Quartz

25 x 25 x 9

Cr

90

various test and diagnostic features

aa)

A04.

VLSI

SHS – 80, -180,
-440, -880, -1800,
-4500, -9400, - QC

8, 18, 44, 88, 180, 450, 940

single bar with rectangular profile, 

100 µm wide,

750 µm length

I

 

Quartz

25 x 25 x 3

Cr

90

various test and diagnostic features

bb)

A05.

VLSI

SHS – 1.8, -8.0,
-24.0, -50.0, - Q

1800, 8000, 24000, 50000

trench

1 mm wide,

2.5 mm length

I

 

Quartz

25 x 25 x 3

Cr

90

Coating optional, suitable for stylus instruments bb)

A06.

Halle

 

200, ..., 9000

trenches of different width for each depth

I

 

Quartz

40 x 20 x 10

 

 

suitable for stylus instruments

A07.

MTT

 

30, ..., 3000

3 trenches with rectangular profile,

100 µm wide,

6 mm length

I

 

Silicon

Æ 37,

3 dick

Cr

 

suitable for stylus instruments

A08.

PTB

Cu Depth Setting Standards

1, 5, 20, 50, 200, 450, 600, 900, 1000, 2000, 5000 µm

grooves with 55° slope, distance between grooves: 400 µm, flat bottom (width 300 µm)

I

³ 1200... 8100

Copper

45 x 23, thickness: 10/12

Nickel

20

Type 900: 1...900 µm,

Type 5000: 5 ...5000 µm

 

Home

 

 

B)

z-Axis:

Periodic Steps

B)

z-Achse:

periodische Stufen

 

 

 

 

 

 

 

 

 

B01.

MikroMasch

TGZ, -01,-02,-03,-04, -11; 

TGF11

 

20, 100, 500, 1000, 1500

TGZ: rectangular profile,

pitch 3 µm;

TGZ11:

pitch 10 µm

I

£ 3000 x 3000

Silicon

5 x 5 x 0,45

 

 

 

B02.

MikroMasch

TGF11

1750

TGF: trapezoidal,

pitch 10 µm

I

£ 3000 x 3000

Silicon

5 x 5 x 0,45

 

 

 

B03.

NTT-AT

Si(111) Atomic Steps

0,13, 0,31 nm

10 steps per

1 µm or 10 µm

I

£ 6000 x 6000

Silicon

10 x 10 

 

 

humidity is kept as low as possible, perhaps use of desiccator for storage

 

Home

 

 

C)

z-Axis:

Step Grating

C)

z-Achse:

Stufen

 

 

 

 

 

 

 

 

 

C01.

MikroMasch

UMG01, 02

20, 31

chess board pattern,

pitch 2 µm

I

£ 400 x 400

Si

5 x 5

 

 

 

C02.

VLSI

STS 2 –180P, -440P,
-1000S, -1800S

18, 44, 100, 180

waffle-like;

pitch:1,8/ 3/ 5 mm

I

£ 270 x 270

SI

12 x 8 x 0,675

Pt

40

3 areas per die,

P: coated, S: non coated, cc),  ee)

C03.

VLSI

STS 3 –180, -440,
-1000, -1800, P

18, 44, 100, 180

waffle-like;

pitch: 3/10/20 mm

I

£ 270 x 270

Si

12 x 8 x 0,5

Pt

40

3 areas per die,

cc) , dd)

C04.

VLSI

STR 3 –180, -440,
-1000, -1800, -P

18, 44, 100, 180

waffle-like;

pitch: 3 mm

I

£ 1200 x
1200

Si

8 x 8

Pt

40

also used as pitch standard / reference,

cc)

C05.

VLSI

STR 10 -180, -440,
-1000, -1800

18, 44, 100, 180

waffle-like;

pitch: 10 mm

I

£ 4 000 x
4 000

Si

8 x 8

Pt

40


           „

C06.

EU-Standard

partly available from Nanosensors

8, 24, 80, 240, 800,

2 400

grating and waffle-like; 

8 - 240: pitch

4µm, 8µm, 80µm;

800 & 2400: pitch

16 µm, 40 µm

I

£ 200 x 200

£ (1000 x 1000)

Si

5 x 7

Pt/Ir

70

mounted on  disc Æ12 mm

 

Home

 

 

D)

x-, y-Axis:

1-Dimensional

D)

x-, y-Achse:

1-Dimensional

 

 

 

 

 

 

 

 

 

D01.

SiMetricS

Lateral Standard LS

10...2500

line grating,

depth: 517 µm

I

250 ...62500

Si

75 x 20

 

 

ISO 5436-1 Type C3

D02.

ASM

750-HD

750

Ni replica of a CD surface structure;

pits arranged in lines,

pitch 750 nm; height 100 nm

I

£ 6350

Ni

Æ 6,35, 0,3 mm thick

-

-

"High durability"

D03.

MikroMasch

TGG 01

3 000

„ridge“ line grating

with < 10 nm edge radius; height: 1,8 mm

I

£ 3 000 x
3 000

Si

5 x 5 x 0,45

 

 

also used as tip characteriser

D04

Moxtek

MXS – 301, -701,-CE

300, 700

line grating;

height: 100 nm

I

 

Si

3 x 4 x0,5

W

60 nm

holographic pattern

 

Home

 

 

E)

x-, y-Axis:

2-Dimensional

E)

x-, y-Achse:

2-Dimensional

 

 

 

 

 

 

 

 

 

E01.

Photomaske

 

20 mm

Cr on quartz substrate

I

120 mm x 120 mm

Quartz

175 x 175

no

 

Test of the positioning properties

E02.

VLSI

STS 2 –180, -440,
-1000, -1800

1 800 + 3 000 + 5 000

waffle-like; step heights: 18, 44, 100, 180 nm

I

£ 270 x 270

SI

12 x 8 x 0,675

Pt

40


          „

E03.

VLSI

STR 3 –180, -440,
-1000, -1800

3 000

waffle-like; step heights: 18, 44, 100, 180 nm

I

£ 1200 x
1200

Si

8 x 8

Pt

40

also used as step height standard / reference

E04.

VLSI

STR 3 –180, -440,
-1000, -1800

10 000

waffle-like; step heights: 18, 44, 100, 180 nm

I

£ 4000 x
4 000

Si

8 x 8

Pt

40


          „

E05.

EU-Standard

partly available from Nanosensors

100, 300,

array of neg. pyramides; depth: 35nm, 100 nm

I

£ 200 x 200

Si

5 x 7

-

-

etch-pits; shape defined by crystalline properties

E06.

EU-Standard

Partly available from Nanosensors / Ibsen

1 000, 3 000, 10 000

flat-topped pyramide-like posts;
height: 100 nm

I

£ 2 000 x
2 000

Si

5 x 7

Pt

100

holographic pattern

E07.

Nanosearch Membrane

NanoCal

10 ... 15

S-layer on Si or glass

I

 

Silicon or

glass

 

 

 

self-assembled layer

E08.

MikroMasch

TGX01

3 000

chess-board, „flared“ pillars with < 5 nm edge radius;

height: 900 nm

I

£ 2 000 x
2 000

Si

5 x 5 x 0,45

-

-

standard also used for 2-dim. tip characterisation

E09.

Moxtek

MXS – 302 CE

300

cylindrical posts; height: 100nm

I

 

Si

3 x 4 x 0,5

W

60

commercial calibration software

E10.

Moxtek

MXS – 702 CE

700

diamond-shaped posts;

height: 100 nm

I

 

Si

3 x 4 x 0,5

W

60

 

E11.

NanoSensors

 

200

array of neg. pyramides;

depth: 70 nm

I

£ 500 x 500

Si

7 x 7

-

-

etch-pits; shape defined by crystalline properties

E12.

Pelco

607 – AFM

607 – STM

463

(2160 lines/mm)

Waffle grating replica

I

 

 

 

Au plated

 

AFM: uncoated, mounted on  disc 12 mm

STM: coated, but unmounted

E13.

SIS

 

1 500

waffle-like pattern;

height: 100 nm

I

£ 100 x 100

Glass/Cr

 

-

-

4 identical areas; Hex numbers in centre

E14.

Supracon

Nanoscale

Linewidth/Pitch - Standard

Pitch: 160, 200, 230, 260, 300, 500, 700, 1000, 4000 nm CD: 80 nm to 2µm

x-gratings, y-gratings, Linewidthstructur, x- y- gratings and circular gratings

I

10 x 10 µm

Quarz

8 x 8 mm² 

a-Si

25

Designed for using in DUVM, CLSM (also usable in AFM and SEM)

 

Home

 

 

F)

3D-Standards

F)

3D-Normal

 

 

 

 

 

 

 

 

 

F01.

3D-Nano-Normal,

 

 

 

I

 

 

 

 

 

 

 

Home

 

 

G)

Flatness

G)

Ebenheit

 

 

 

 

 

 

 

 

 

G01.

SiMetricS

Flatness Standard Type FtS

PV < 110/65

Flat ref. area

I

£ 10 mm x 10 mm/

£ 5 x 5

Si

15 x 15 x 6

SiO2

 

 

G02.

EU-Standard

partly available from Nanosensors

PV < 10

Flat ref. area

I

£ 250 x 250

Quartz

5 x 7 x 2

Cr

100

 

 

Home

 

H)

Thickness

H)

Schichtdicke

 

 

 

 

 

 

 

 

 

H01.

Inst. Mikro elektroden

SiO2 on Si

7, 20, 70, 300, 800

3 lines with different width 5, 30, and 100 µm

I

£ 4000

SiO2/Si

5 x 7

Cr

100

 

 

Home

 

 

I)

Roughness

I)

Rauheit

 

 

 

 

 

 

 

 

 

I01.

VLSI

RAS-90, 220, 440, 900, 2250, 4700

9, 22, 44, 90, 225, 470

4 separate fields with 6, 20, 60, and 200 µm pitch rectangular profile

I

£ ~5000 x 4500

Silicon die on Quartz

25 x 25 x 6

 

 

Roughness standard for Ra

 

Home

 

 

J)

Critical Dimension

J)

Kritische Dimension

 

 

 

 

 

 

 

 

 

J01.

Pelco

 

1, 2, 5, 10µm

central area comprises four line patterns

I

£ 180

Silicon

4.8 x 4.5

 

 

for SEM

J02.

Supracon

Nanoscale CD - Standard

CD: 50, 100, 150, 200, 300 und 800 nm

6 grups of  5 CD-Si-bars, space between bars 1µm, depth: 250 nm

I

10 x10

Si

8 x 8 mm²

 

 

Designed for using in AFM (also usable in SEM)

 

Home

 

 

K)

Tip Radius,
Angle, Parallelity

K)

Spitzenradius,
Winkel, Parallelität

 

 

 

 

 

 

 

 

 

K01.

SiMetricS

Type 1

4 gratings with the periods:
0.8; 1.0; 2.0; 2.5 µm

Triangular profile: GrT70
(angle 70.52°)
Triangular profile: GrT109
(angle 109.48°)

I

£

Si

10 x 10

SiO2

 

 

K02.

SiMetricS

Type 2

1 grating with the period:
8 or 25 µm

Trapezoidal profile: GrTz55
(Trapezoidal angle 54.74°)
Depth: 3 µm for 8 µm period
Depth: 11 µm for 25 µm period
Triangular profile: GrT70
(angle 70.52°)
Triangular profile: GrT109
(angle 109.48°)
Arched profile: GrA

I

£

Si

10 x 10

SiO2

 

 

K03.

SiMetricS

Type 3

1 grating with the period:
8 or 25 µm

Rectangular profile: GrRw
Depth: 1 µm for 8 µm period
Depth: 5 µm for 25 µm period

I

£

Si

10 x 10

SiO2

 

 

K04

SiMetricS

Type 4

8 gratings with the periods:
4; 8; 20; 40; 80; 200; 400; 800 µm

Rectangular profile: GrRd
Depth: 90 nm or 3,4 µm

I

£

Si

 

SiO2

 

 

 

Home

 

 

L)

Contour, Profile

L)

Kontur, Profil

 

 

 

 

 

 

 

 

 

L01.

PTB

Micro contour artefact  

100 µm, 250 µm, 500 µm, 1000 µm,

2000 µm

profile of cylindrical (180°),  and prismatic elements (45°, 60°, 80°)

I

0.5 x 0.5

to

18 x 3

Steel

50 x 3 x 15

 

 

 

Test and comparison of optical and tactile micro sensors

 

Home

 

 

M)

Diameter,

Poundness

M)

Durchmesser,

Zylindrizität

 

 

 

 

 

 

 

 

 

M01

PTB

Micro hole artefact 

Ø 100 µm

x 2.4 mm

cylinder

I

150

Steel

10 x 10

 

 

Test of tactile micro sensors

 

Home

 

 

N)

Probing Force

N)

Antastkraft

 

 

 

 

 

 

 

 

 

N01.

SiMetricS

Probing force standard Type FC

0.005 – 1.0 mN/µm

cantilever for probing with stylus intruments, indenters etc.

I

 

Si

15 x 15

SiO2

 

 

N02.

SiMetricS

Probing force standard Type FB

0.3 – 5.5 mN/µm

cantilever fixed at both sides for probing with stylus intruments, indenters etc.

I

 

Si

15 x 15

SiO2

 

 

 

aa )      available on 200 mm Si wafer

bb )      available on 200 and 300 mm wafer

cc )      optional mounted on 25 x 25 x 0,6 mm 3 Quartz bloc or 100 - 200 mm Silicon wafer

dd )      standard is accompanied by a STR10 of same height

ee )      standard is accompanied by a STR2 of same height

  

Home

 

This tabulated synopsis contains currently available artefacts which may be used as standards and which are suitable for the calibration of stylus or optical instruments and SPMs. Standards are listed in an arbitrary order within the sections without any ranking or preference. This list does not imply recommendation or endorsement by PTB, nor does it imply that the listed standards are necessarily the best and/or only available for the purpose. No claim is put forward to the completeness and correctness of the list of manufacturers and products

 

 

Manufacturer / Distributor and contact address

A01.    SiMetricS GmbH, Siliziumkomponenten für die Messtechnik, Am Südhang 5, 09212 Limbach-Oberfrohna and J. Fruehauf, S. Kroenert, U.    Brand, R. Krueger-Sehm: Attainable precision of silicon dimensional standards. Proc. Euspen Conf. (2004),

joachim.fruehauf@e-technik.tu-chemnitz.de and < www.SiMetricS.de >

 

A02.    PELCO  INTERNATIONAL, P.O. Box 492477, Redding, CA 96049-2477, USA;< www.pelcoint.com/index >

A03.    Veeco GmbH, D-85716 Unterschleißheim, Germany; < www.veeco-europe.com > or  < www.veeco.com >

A04.    VLSI Standards Inc.; 3087 North First Street; San Jose, CA 95134-2006, USA; < www.vlsistd.com >

A05.    See A04.

A06.    Halle Präzisions-Kalibriernormale GmbH, Im Bühfeld 12, D-31234 Edemissen, Germany; Fax: +49 5373 7669

A07.    Meracia Technika- Technocentrum, P.O. Box 249, SK 84000 Bratislava, Slovakia; Fax: +42 17 6542 6143

A08.    PTB Cu Depth Setting Standards, PTB, AG 5.11, Bundesallee 100, 38116 Braunschweig;                                                              

< www.ptb.de/de/org/5/51/511/index.htm > and U. Brand, G. Hinzmann, H. Schnädelbach, C. Feist, P. Stuht, R. Krüger-Sehm, V. Jäger: Rückführbare Präzisions-Tiefen-Einstellnormale für Messbereiche von 1 µm bis 1 mm (Traceable precision depth setting standards for measurement ranges from 1 µm to 1 mm). Technisches Messen 66, 12 (1999), 496-503. uwe.brand@ptb.de

 

B01.    MikroMasch, Narva mnt. 13, 10151 Tallina, Estonia; < www.mikromasch.com >

B02.    See B01.

B03.    NTT Advanced Techn. Corp., 3-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0198, Japan; < www.keytech.ntt-at.co.jp >

 

C01.    See B01.

C02.    See A04.

C03.    See A04.

C04.    See A04.

C05.    See A04.

C06.    EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >

 

D01.    SiMetricS GmbH, Siliziumkomponenten für die Messtechnik, Am Südhang 5, 09212 Limbach-Oberfrohna

joachim.fruehauf@e-technik.tu-chemnitz.de and  < www.SiMetricS.de >

D02.    Advanced Surface Microscopy, Inc. 6009 Knyghton Rd; Indianapolis, IN 46220, USA; < www.asmicro.com >

D03.    See B01.

D04.    Moxtek Inc. Orem, UT 84057, USA; < www.moxtek.com >

 

E01.     ML&C GmbH, Im Steinfeld 5, D-07751 Jena  info@mlc-jena.de < www.mlc-jena.de >

E02.     See A04.

E03.     See A04.

E04.     See A04.

E05.     EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com > 7669 und Ibsen Photonics A/S, DK-3520 Farum, Denmark;  < www.ibsenphotonics.com >

 

E06.      EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >  und Ibsen Photonics A/S, DK-3520 Farum, Denmark;  < www.ibsenphotonics.com >

E07.     Nanosearch Membrane GmbH, TSP Nanoengineering, A-1160 Vienna, Austria; < www.nanosearch.at >

E08.     See B01.

 

E09.     See D04.

E10.     See D04.

E11.     NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >

E12.     See A02.

E13.     SIS Surface Imaging Systems GmbH; Kaiserstr. 100, D-52134 Herzogenrath, Germany; < www.sis-gmbh.com >

E14.     Supracon AG, Wildenbruchstr. 15,  07745 Jena, Germany, Tel. +49 (3641) 67 53 80,  Fax. +49 (3641) 67 53 87,

info@supracon.com,  < www.supracon.com >

 

F01.     M. Ritter, Bundesanstalt für Materialforschung und-prüfung (BAM), Unter den Eichen 87, 12205 Berlin, info@bam.de < www.bam.de >

 

G01.    See D01.

G02.    EU project "Transfer Standards for Calibration of SPMs” Information may be obtained from the coordinator Dr. Jørgen Garnæs, DFM, Lyngby, Denmark (JG@dfm.dk). NANOSENSORS, IMO-Building, Im Amtmann 6, D-35578 Wetzlar-Blankenfeld, Germany; <www.nanosensors.com >

 

H01.    Institute for Microelectronics Stuttgart, Allmandring 30 a, D-70569 Stuttgart, Germany;< www.ims-chips.de >

 

I01.      See A04.

 

J01.     See A02.

J02.     See E14.

   

K01.    See D01.

K02.    See D01.

K03.    See D01.

K04.    See D01.

 

L01.     Neugebauer M, Jusko O, Neuschaefer-Rube U, Wäldele F: Darf´s etwas kleiner sein? Quality Engineering, 9 (2004), 32. And: Neugebauer M, Neuschaefer-Rube U: A new micro artefact for testing of optical and tactile sensors. Proceedings of  Euspen conference 2005.  michael.neugebauer@ptb.de

 

M01.   Brand, U; Neugebauer, M; Neuschaefer-Rube, U; Wilkening, G: Micro-Standards – State of the Art, Prospects and Limits. Proc. Sensor Conf., Vol. 2 (2005), 169-174. ulrich.neuschaefer-rube@ptb.de

 

N01.    See D01.

N02.    See D01.

 

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